Congratulations to local actress Enhle Mbali Mlotshwa who recently won her first International award for Best Designer at the Fashion Communist Week in San Francisco.
Mlotshwa was awarded for her clothing line Essie Apparel which was launched in late 2019. “Won my first international award as Essie Apparel for best Designer this weekend in San Francisco!!” She said on her triumph. “So proud of my team and thank you all for the support!
Onwards and Upwards, let us take up space.” Won my first international award as @essie_apparel for best Desighner this weekend is San Francisco!!
So proud of my team and thank you all for the support!! Onwards and Upwards , Lets take up space. #simplylive #simplylove #simplyenhle
Read more on peoplemagazine.co.za
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